Adisyn Ltd (ASX: AI1) today announced a major development in its quest to revolutionise the semiconductor industry with the procurement of a cutting-edge Atomic Layer Deposition (ALD) machine. The machine, ordered by its soon-to-be-acquired subsidiary 2D Generation Ltd, will enable precise, ultra-thin graphene layering on semiconductor interconnects—potentially transforming high-performance computing with unprecedented speed, energy efficiency, and scalability.
Indicative Beneq ALD System (supplied)
This ALD system, sourced from Beneq—a global leader in deposition technology—is expected to accelerate 2D Generation’s production of high-performance semiconductors that meet the complex requirements of generative AI, data centres, and defence applications. Set for installation in the next 5-6 months, this ALD system is pivotal to 2D Generation’s plans for high-precision graphene-coated interconnects, which could alleviate key bottlenecks in chip manufacturing.
Why the New ALD Machine Matters
An ALD machine is essential in semiconductor manufacturing for layering materials at an atomic scale, crucial for graphene-based chips where every nanometre impacts performance. Graphene’s potential to drastically improve power efficiency, reduce heat, and increase data transfer speeds has long been recognised. However, effectively integrating graphene onto chip interconnects—a challenge that includes precision and temperature requirements—has remained an unsolved industry-wide challenge.
With its unique design, 2D Generation’s ALD machine:
- Supports liquid and ozone sources for varied thin-film material applications.
- Handles 200 mm wafers and smaller adapters, ensuring scalability.
- Operates at temperatures up to 400°C—suitable for sensitive graphene coating that requires both stability and uniformity.
This machine’s specialised capabilities make it ideal for advancing 2D Generation’s graphene deposition technology, particularly for maintaining graphene’s structural integrity at sub-300°C. This has never been achieved at scale before but is necessary for the next generation of semiconductors.
Strategic Rationale and Financial Moves
The acquisition of 2D Generation, set in motion by a binding agreement on 4 November, aligns Adisyn’s ambitions in AI, data centre technologies, and cybersecurity with the emerging semiconductor IP at 2D Generation’s core. As Adisyn’s Chairman Shane Wee emphasised, integrating 2D Generation is “a step towards industry leadership, particularly in sectors where efficient, high-speed chips are critical.”
To support this strategic investment, Adisyn has loaned 2D Generation US$350,000 interest-free to cover the ALD system’s deposit, with repayment due by August 2025 if the acquisition is not completed by February 2025. This follows Adisyn’s recent $3 million capital raise, which further underscores its commitment to positioning 2D Generation’s technology for commercialisation and licensing.
Graphene Coating: The Semiconductor “Holy Grail”
The essence of 2D Generation’s IP is its ability to coat chip interconnects—key pathways that enable communication within an integrated circuit (IC)—with graphene. Traditional materials like copper are becoming bottlenecks as chip designs scale down, facing increased resistance, power consumption, and production complexity. Graphene, however, offers significant advantages in each of these areas, allowing for:
- Faster data processing and reduced signal delay: Essential for the AI-driven demands on modern chips.
- Lower power consumption and reduced thermal footprint: Critical in reducing costs and supporting sustainable, high-density data centres.
- Extended scalability in semiconductor manufacturing: Aligning with the push for more powerful, smaller, and cheaper chips that meet Moore’s Law.
2D Generation’s ability to achieve in-situ graphene coating on interconnects at under 300°C makes it uniquely positioned to address these industry needs. This IP will likely attract significant interest from global semiconductor manufacturers, as demonstrated by its involvement in the EU-backed Connecting Chips initiative alongside NVIDIA, Valeo, and Applied Materials.
A Technological Leap Forward
This ALD machine represents more than just a new piece of equipment for 2D Generation—it is a catalyst for advancing graphene-based semiconductor technology. The company has already demonstrated basic graphene deposition but now requires the uniformity and precision that the Beneq ALD machine promises. If successful, 2D Generation will be positioned to license this technology, potentially transforming semiconductor manufacturing and enabling high-performance, AI-ready chips.
As Chairman and CEO of 2D Generation Arye Kohavi aptly noted, “the ability to coat interconnects with graphene at temperatures below 300 degrees is a critical development, one that is indispensable for the future evolution of the industry.”
With the ALD machine on its way, both Adisyn and 2D Generation are well on track to usher in a new era of semiconductor capabilities that could reshape the industry. If all goes to plan, this high-stakes investment may well pay dividends in putting Adisyn on the semiconductor map—just in time for the AI revolution.
